Memory device and manufacturing method thereof
Abstract:
A memory device includes a substrate, first and second wirings above the substrate, a third wiring above the first and second wirings, a fourth wiring above the third wiring, a first contact electrically connected between the first wiring and the fourth wiring, a first insulator on the first contact, and a second contact on the first insulator, the second contact being electrically connected between the second wiring and the third wiring. The first contact overlaps the second contact in a direction that is orthogonal to an upper surface of the substrate.
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