- 专利标题： Polishing pad having polishing surface with continuous protrusions
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申请号： US13747139申请日： 2013-01-22
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公开(公告)号： US09649742B2公开(公告)日： 2017-05-16
- 发明人: Paul Andre Lefevre , William C. Allison , Alexander William Simpson , Diane Scott , Ping Huang , Leslie M. Charns , James Richard Rinehart , Robert Kerprich
- 申请人： NexPlanar Corporation
- 申请人地址： US OR Hillsboro
- 专利权人： NexPlanar Corporation
- 当前专利权人： NexPlanar Corporation
- 当前专利权人地址： US OR Hillsboro
- 代理商 Thomas Omholt; Erika Wilson; Justin K. Brask
- 主分类号： B24B37/22
- IPC分类号： B24B37/22 ; B24B37/26 ; B24B37/20
摘要：
Polishing pads having a polishing surface with continuous protrusions are described. Methods of fabricating polishing pads having a polishing surface with continuous protrusions are also described.
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