Invention Grant
- Patent Title: Large area seed crystal for ammonothermal crystal growth and method of making
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Application No.: US14249708Application Date: 2014-04-10
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Publication No.: US09650723B1Publication Date: 2017-05-16
- Inventor: Mark P. D'Evelyn , Wenkan Jiang , Derrick S. Kamber , Rajeev T. Pakalapati , Michael R. Krames
- Applicant: SORAA, INC.
- Applicant Address: US CA Fremont
- Assignee: Soraa, Inc.
- Current Assignee: Soraa, Inc.
- Current Assignee Address: US CA Fremont
- Agency: Saul Ewing LLP
- Main IPC: C30B7/10
- IPC: C30B7/10 ; C30B9/00 ; C30B29/40 ; C30B25/02 ; H01L21/02

Abstract:
Large area seed crystals for ammonothermal GaN growth are fabricated by deposition or layer transfer of a GaN layer on a CTE-matched handle substrate. The sides and back of the handle substrate are protected from the ammonothermal growth environment by a coating comprising an adhesion layer, a diffusion barrier layer, and an inert layer. A patterned mask, also comprising an adhesion layer, a diffusion barrier layer, and an inert layer, may be provided over the GaN layer to allow for reduction of the dislocation density by lateral epitaxial growth.
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