Invention Grant
- Patent Title: Method for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatus
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Application No.: US14400815Application Date: 2013-05-14
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Publication No.: US09653259B2Publication Date: 2017-05-16
- Inventor: Paul IJmert Scheffers
- Applicant: MAPPER LITHOGRAPHY IP B.V.
- Applicant Address: NL Delft
- Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee Address: NL Delft
- Agency: Hoyng Monegier LLP
- Agent David P. Owen
- International Application: PCT/EP2013/059861 WO 20130514
- International Announcement: WO2013/171177 WO 20131121
- Main IPC: H01J37/00
- IPC: H01J37/00 ; H01J37/304 ; B82Y10/00 ; H01J37/317 ; B82Y40/00 ; G01B11/14

Abstract:
The invention relates to a method for determining a beamlet position in a charged particle multi-beamlet exposure apparatus. The apparatus is provided with a sensor comprising a conversion element for converting charged particle energy into light and a light sensitive detector. The conversion element is provided with a sensor surface area provided with a 2D-pattern of beamlet blocking and non-blocking regions. The method comprises taking a plurality of measurements and determining the position of the beamlet with respect to the 2D-pattern on the basis of a 2D-image created by means of the measurements. Each measurement comprises exposing a feature onto a portion of the 2D-pattern with a beamlet, wherein the feature position differs for each measurement, receiving light transmitted through the non-blocking regions, converting the received light into a light intensity value, and assigning the light intensity value to the position at which the measurement was taken.
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