Invention Grant
- Patent Title: On-SOI integrated circuit comprising a lateral diode for protection against electrostatic discharges
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Application No.: US13933441Application Date: 2013-07-02
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Publication No.: US09653476B2Publication Date: 2017-05-16
- Inventor: Claire Fenouillet-Beranger , Pascal Fonteneau
- Applicant: Commissariat à l'énergie atomique et aux énergies alternatives , STMicroelectronics SA
- Applicant Address: FR Paris FR Montrouge
- Assignee: Commissariate a l'energie atomique et aux energies alternatives,STMicroelectronics SA
- Current Assignee: Commissariate a l'energie atomique et aux energies alternatives,STMicroelectronics SA
- Current Assignee Address: FR Paris FR Montrouge
- Agency: Occhiuti & Rohlicek LLP
- Priority: FR1256800 20120713
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L27/02

Abstract:
An integrated circuit includes a transistor, an UTBOX buried insulating layer disposed under it and a ground plane disposed under the layer. A well is disposed under the plane and a first trench is at the periphery of the transistor and extends through the layer into the well. There is a substrate under the well and a p-n diode on a side of the transistor. The diode comprises first and second zones of opposite doping and the first zone is configured for electrical connection to a first electrode of the transistor. The first and second zones are coplanar with the plane and a second trench for separating the first and second zones. The second trench extends through the layer into the plane to a depth less than an interface between the plane and the well. There is a third zone under the second trench forming a junction between the zones.
Public/Granted literature
- US20140017858A1 On-SOI integrated circuit comprising a lateral diode for protection against electrostatic discharges Public/Granted day:2014-01-16
Information query
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