Invention Grant
- Patent Title: CMOS-MEMS device structure, bonding mesa structure and associated method
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Application No.: US14792058Application Date: 2015-07-06
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Publication No.: US09656852B2Publication Date: 2017-05-23
- Inventor: Chun-Wen Cheng , Yi-Chuan Teng
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Main IPC: B81B3/00
- IPC: B81B3/00 ; B81C1/00

Abstract:
The present disclosure provides a CMOS-MEMS device structure. The CMOS-MEMS device structure includes a sensing substrate and a CMOS substrate. The sensing substrate includes a bonding mesa structure. The CMOS substrate includes a top dielectric layer. The sensing substrate and the CMOS substrate are bonded through the bonding mesa structure, and the bonding mesa structure defines a bonding gap between the CMOS substrate and the sensing substrate.
Public/Granted literature
- US20170008757A1 CMOS-MEMS DEVICE STRUCTURE, BONDING MESA STRUCTURE AND ASSOCIATED METHOD Public/Granted day:2017-01-12
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