Invention Grant
- Patent Title: Defect inspection method
-
Application No.: US15010536Application Date: 2016-01-29
-
Publication No.: US09658128B2Publication Date: 2017-05-23
- Inventor: Akira Tanaka , Masaya Hirashima , Satoru Yasui , Mayumi Naito
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: JP2015-200437 20151008
- Main IPC: G01N23/05
- IPC: G01N23/05 ; G01M3/20

Abstract:
A defect inspection method according to an embodiment has: exposing a target object to a tracer having higher absorptance for a neutron ray than the target object; radiating the neutron ray to the target object exposed to the tracer; generating at least one neutron image based on the neutron ray having penetrated the target object exposed to the tracer; and detecting a defect of the target object based on the generated at least one neutron image.
Public/Granted literature
- US20170102285A1 DEFECT INSPECTION METHOD Public/Granted day:2017-04-13
Information query