Invention Grant
- Patent Title: Thin film transistor array panel comprising etch stopper for shaping a channel
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Application No.: US14466944Application Date: 2014-08-22
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Publication No.: US09659972B2Publication Date: 2017-05-23
- Inventor: Eun Hyun Kim
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: Lewis Roca Rothgerber Christie LLP
- Priority: KR10-2014-0018053 20140217
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/417

Abstract:
A thin film transistor array panel includes: a substrate; gate lines on the substrate, each of the gate lines including a gate electrode; a semiconductor layer on the substrate; an etching stopper on the semiconductor layer; a data wiring layer on the substrate and including a data line, a source electrode connected to the data line, and a drain electrode; and a passivation layer covering the source electrode, the drain electrode, and the etching stopper, where the etching stopper includes an etching prevention portion between the source electrode and the drain electrode, a shortest distance A between an upper side and a lower side of an overlap area where the etching prevention portion and the semiconductor layer overlap one another is represented by a straight line in a plane view, and a width of a channel portion of the semiconductor layer is greater than the shortest distance A.
Public/Granted literature
- US20150236044A1 THIN FILM TRANSISTOR ARRAY PANEL Public/Granted day:2015-08-20
Information query
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