- Patent Title: Thin film transistor substrate and method of manufacturing the same
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Application No.: US14920741Application Date: 2015-10-22
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Publication No.: US09660099B2Publication Date: 2017-05-23
- Inventor: Seok-Hwan Bang , Hyung-Jun Kim , Ji-Man Lim
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR
- Priority: KR10-2014-0174127 20141205
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/66 ; H01L29/786 ; H01L29/423 ; H01L21/02

Abstract:
A thin film transistor substrate includes a gate electrode disposed on a base substrate, an active pattern overlapping the gate electrode, a source metal pattern including both a source electrode disposed on the active pattern and a drain electrode spaced apart from the source electrode, a buffer layer disposed on the source metal pattern and contacting the active pattern, a first passivation layer disposed on the buffer layer and a second passivation layer disposed on the first passivation layer. The density of hydrogen in the buffer layer is greater than the density of hydrogen in the first passivation layer and less than the density of hydrogen in the second passivation layer.
Public/Granted literature
- US20170117415A1 THIN FILM TRANSISTOR SUBSTRATE HAVING STACKED PASSIVATION LAYERS Public/Granted day:2017-04-27
Information query
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