Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
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Application No.: US14431229Application Date: 2013-10-08
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Publication No.: US09665012B2Publication Date: 2017-05-30
- Inventor: Edo Maria Hulsebos
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2013/070891 WO 20131008
- International Announcement: WO2014/072139 WO 20140515
- Main IPC: G03B27/68
- IPC: G03B27/68 ; G03F7/20

Abstract:
A method involving obtaining first calibration vibration data relating to vibrations of the lithographic apparatus from a sensor that is part of the lithographic apparatus and obtaining second calibration vibration data, the second calibration vibration data being a component of first parameter data of the lithographic apparatus. A filter is calculated from the first and second calibration vibration data, the filter being such that when applied to the first calibration vibration data, its output correlates closer with the second calibration vibration data. The filter can then be applied to vibration data obtained using the first sensor to obtain an estimate of a vibration component of the first parameter data during the lithographic process.
Public/Granted literature
- US20150241791A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2015-08-27
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