Invention Grant
- Patent Title: Methods and apparatus for uniformly metallization on substrates
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Application No.: US14127285Application Date: 2011-06-24
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Publication No.: US09666426B2Publication Date: 2017-05-30
- Inventor: Hui Wang , Yue Ma , Chuan He , Xi Wang
- Applicant: Hui Wang , Yue Ma , Chuan He , Xi Wang
- Applicant Address: CN Shanghai
- Assignee: ACM Research (Shanghai) Inc.
- Current Assignee: ACM Research (Shanghai) Inc.
- Current Assignee Address: CN Shanghai
- Agency: Osha Liang LLP
- International Application: PCT/CN2011/076262 WO 20110624
- International Announcement: WO2012/174732 WO 20121227
- Main IPC: C25D7/12
- IPC: C25D7/12 ; C25D5/20 ; H01L21/02 ; C25D17/00 ; C25D5/08 ; C25D5/18 ; C25D17/06 ; C25D21/10

Abstract:
An apparatus for substrate metallization from electrolyte is provided. The apparatus comprises: an immersion cell containing metal salt electrolyte; at least one electrode connecting to at least one power supply; an electrically conductive substrate holder holding at least one substrate to expose a conductive side of the substrate to face the at least one electrode; an oscillating actuator for oscillating the substrate holder with an amplitude and a frequency; at least one ultrasonic device with an operating frequency and an intensity, disposed in the metallization apparatus; at least one ultrasonic power generator connecting to the ultrasonic device; at least one inlet for metal slat electrolyte feeding; and at least one outlet for metal salt electrolyte draining.
Public/Granted literature
- US20140216940A1 METHODS AND APPARATUS FOR UNIFORMLY METALLIZATION ON SUBSTRATES Public/Granted day:2014-08-07
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