Invention Grant
- Patent Title: Multi-stage element removal using absorption layers
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Application No.: US15081831Application Date: 2016-03-25
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Publication No.: US09666794B2Publication Date: 2017-05-30
- Inventor: Volodymyr Voznyuk , Dustin Erickson
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR
- Agency: Renaissance IP Law Group LLP
- Main IPC: H01L43/12
- IPC: H01L43/12 ; H01L43/08

Abstract:
An MTJ structure and method for providing the same are described. The method may include providing a free layer, a pinned layer, and a nonmagnetic spacer layer between the free layer and the pinned layer. Providing the free layer and/or the pinned layer may include depositing a portion of the desired MTJ layer, depositing a sacrificial layer, annealing the MTJ and sacrificial layer, removing at least a portion of the sacrificial layer, and depositing a remaining portion of the desired MTJ layer. The steps of depositing a sacrificial layer, annealing, and removing the sacrificial layer may be repeated multiple times with process conditions selected for each stage so as to reduce the risk of damage to the underlying MTJ layer. The desired MTJ layer may be the free layer, the pinned layer, or both.
Public/Granted literature
- US20160211444A1 MULTI-STAGE ELEMENT REMOVAL USING ABSORPTION LAYERS Public/Granted day:2016-07-21
Information query
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