Invention Grant
- Patent Title: Photoresist employing photodimerization chemistry and method for manufacturing organic light emitting diode display using the same
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Application No.: US14830034Application Date: 2015-08-19
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Publication No.: US09666802B2Publication Date: 2017-05-30
- Inventor: Jinkyun Lee , Youngmi Kim , Jonggeun Yoon , Joonyoung Heo , Euidoo Do , Yeonkyeong Lee , Soohyun Kim
- Applicant: LG Display Co., Ltd. , INHA Industry Partnership Institute
- Applicant Address: KR Seoul KR Incheon
- Assignee: LG Display Co., Ltd.,INHA Industry Partnership Institute
- Current Assignee: LG Display Co., Ltd.,INHA Industry Partnership Institute
- Current Assignee Address: KR Seoul KR Incheon
- Agency: Fenwick & West LLP
- Priority: KR10-2012-0138223 20121130
- Main IPC: G03F7/038
- IPC: G03F7/038 ; H01L51/56 ; H01L27/32 ; C08F20/24 ; H01L51/00 ; C08F20/10 ; G03F7/004
Abstract:
A highly fluorinated photoresist employing a photodimerization chemistry and a method for manufacturing an organic light emitting diode display using the same. The photoresist includes a copolymer that is made from two different monomers. When the copolymer is used as a photoresist, the photoresist has the characteristic that it becomes insoluble when exposed to an ultraviolet light having a wavelength of 365 nm.
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