- 专利标题: Reduction of SiCl4 in the presence of BCl3
-
申请号: US14660786申请日: 2015-03-17
-
公开(公告)号: US09669378B2公开(公告)日: 2017-06-06
- 发明人: Mark W. Raynor , Daniel J. Tempel , Junpin Yao , Larry Wagg , Adam Seymour
- 申请人: Matheson Tri-Gas, Inc.
- 申请人地址: US NJ Basking Ridge
- 专利权人: Matheson Tri-Gas, Inc.
- 当前专利权人: Matheson Tri-Gas, Inc.
- 当前专利权人地址: US NJ Basking Ridge
- 主分类号: C01B35/06
- IPC分类号: C01B35/06 ; B01J19/02 ; B01D9/00 ; B01D53/04
摘要:
The present invention relates, in general, to the purification of boron trichloride (BCl3). More particularly, the invention relates to a process for minimizing silicon tetrachloride (SiCl4) formation in BCl3 production and/or the removal of SiCl4 in BCl3 product stream by preventing/minimizing the silicon source in the reaction chambers. In addition, a hydride material may be used to convert any SiCl4 present to SiH4 which is easier to remove. Lastly freeze separation would replace fractional distillation to remove SiCl4 from BCl3 that has been partially purified to remove light boilers.
公开/授权文献
- US20150266744A1 REDUCTION OF SiCl4 IN THE PRESENCE OF BCl3 公开/授权日:2015-09-24
信息查询