Invention Grant
- Patent Title: Semiconductor device having sufficient process margin and method of forming same
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Application No.: US14264694Application Date: 2014-04-29
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Publication No.: US09673195B2Publication Date: 2017-06-06
- Inventor: Man-Hyoung Ryoo , Gi-Sung Yeo , Si-Hyeung Lee , Gyu-Chul Kim , Sung-Gon Jung , Chang-Min Park , Hoo-Sung Cho
- Applicant: Samsung Electronics Co., LTD.
- Applicant Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Agency: Muir Patent Law, PLLC
- Priority: KR10-2003-0048223 20030715
- Main IPC: H01L27/11
- IPC: H01L27/11 ; H01L27/088 ; G11C11/412 ; H01L27/02

Abstract:
According to some embodiments of the invention, a substrate doped with a P type impurity is provided. An N type impurity is doped into the substrate to divide the substrate into a P type impurity region and an N type impurity region. Active patterns having a first pitch are formed in the P type and N type impurity regions. Gate patterns having a second pitch are formed on the active patterns in a direction substantially perpendicular to the active patterns. Other embodiments are described and claimed.
Public/Granted literature
- US20140231925A1 SEMICONDUCTOR DEVICE HAVING SUFFICIENT PROCESS MARGIN AND METHOD OF FORMING SAME Public/Granted day:2014-08-21
Information query
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