- Patent Title: Etching method of glass substrate and wet etching apparatus thereof
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Application No.: US14381984Application Date: 2014-07-14
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Publication No.: US09676661B2Publication Date: 2017-06-13
- Inventor: Jia Li
- Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Shenzhen, Guangdong
- Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
- Current Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
- Current Assignee Address: CN Shenzhen, Guangdong
- Agent Andrew C. Cheng
- Priority: CN201410298834 20140626
- International Application: PCT/CN2014/082131 WO 20140714
- International Announcement: WO2015/196520 WO 20151230
- Main IPC: C03C15/00
- IPC: C03C15/00

Abstract:
The present invention provides an etching method of a glass substrate and a wet etching apparatus thereof. The etching method of the glass substrate comprises steps of: providing a glass substrate (1) to be etched, a wet bench (3), etchants and a supply line (7); setting a tank (9) in the wet bench (3); filling in the tank (9) with a predetermined amount of the etchants through the supply line (7); delivering the glass substrate (1) to be etched into the wet bench (3); raising the tank (9) until the glass substrate (1) is completely immersed with the etchants in the tank (9); lowering the tank (9) to expose the glass substrate (1) after a predetermined soaking time. The etching method of the glass substrate is simple and easy for operation. It is capable of shortening the etching process time and raising the production efficiency.
Public/Granted literature
- US20160236973A1 ETCHING METHOD OF GLASS SUBSTRATE AND WET ETCHING APPARATUS THEREOF Public/Granted day:2016-08-18
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