Invention Grant
- Patent Title: Process, stack and assembly for separating a structure from a substrate by electromagnetic radiation
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Application No.: US14909969Application Date: 2014-08-05
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Publication No.: US09679777B2Publication Date: 2017-06-13
- Inventor: Yann Sinquin , Jean-Marc Bethoux , Oleg Kononchuk
- Applicant: Soitec
- Applicant Address: FR Bernin
- Assignee: Soitec
- Current Assignee: Soitec
- Current Assignee Address: FR Bernin
- Agency: TraskBritt
- Priority: FR1301905 20130808
- International Application: PCT/FR2014/052034 WO 20140805
- International Announcement: WO2015/019018 WO 20150212
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/268 ; H01L31/0687 ; H01L21/78 ; H01L29/20 ; H01L33/00

Abstract:
A method for separating a structure from a substrate through electromagnetic irradiations (EI) belonging to a spectral range comprises the steps of a) providing the substrate, b) forming an absorbent separation layer on the substrate, c) forming the structure to be separated on the separation layer, d) exposing the separation layer to the electromagnetic irradiations (EI) via the substrate such that the separation layer breaks down under the effect of the heat stemming from the absorption, the method being notable in that it comprises a step b1) of forming a transparent thermal barrier layer on the separation layer, the exposure period and the thickness of the thermal barrier layer being adapted such that the temperature of the structure to be separated remains below a threshold during the exposure period, beyond which threshold, faults are likely to appear in the structure.
Public/Granted literature
- US20160189965A1 PROCESS, STACK AND ASSEMBLY FOR SEPARATING A STRUCTURE FROM A SUBSTRATE BY ELECTROMAGNETIC RADIATION Public/Granted day:2016-06-30
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