Invention Grant
- Patent Title: Self-aligned back end of line cut
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Application No.: US15336589Application Date: 2016-10-27
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Publication No.: US09679805B2Publication Date: 2017-06-13
- Inventor: Guillaume Bouche , Andy Chih-Hung Wei , Mark A. Zaleski
- Applicant: GLOBALFOUNDRIES INC.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Williams Morgan, P.C.
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/52 ; H01L21/768 ; H01L23/528 ; H01L23/522 ; H01L23/532 ; H01L21/311
Abstract:
Embodiments of the present invention provide a method for self-aligned metal cuts in a back end of line structure. Sacrificial Mx+1 lines are formed above metal Mx lines. Spacers are formed on each Mx+1 sacrificial line. The gap between the spacers is used to determine the location and thickness of cuts to the Mx metal lines. This ensures that the Mx metal line cuts do not encroach on vias that interconnect the Mx and Mx+1 levels. It also allows for reduced limits in terms of via enclosure rules, which enables increased circuit density.
Public/Granted literature
- US20170047247A1 SELF-ALIGNED BACK END OF LINE CUT Public/Granted day:2017-02-16
Information query
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