Invention Grant
- Patent Title: Sensor system for lithography
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Application No.: US14436046Application Date: 2013-09-10
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Publication No.: US09690207B2Publication Date: 2017-06-27
- Inventor: Haico Victor Kok , Robbert Jan Voogd
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2013/068669 WO 20130910
- International Announcement: WO2014/060149 WO 20140424
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00 ; G01B11/06 ; G01B11/14

Abstract:
A sensor system to measure a physical quantity, the system including a parallel detection arrangement with multiple detectors to allow measurements in parallel at different spatial locations, wherein the multiple detectors share a noise source, wherein the sensor system is configured such that the multiple detectors each output a signal as a function of the physical quantity, and wherein the sensor system is configured such that at least one detector responds differently to noise originating from the shared noise source than the one or more other detectors.
Public/Granted literature
- US20150286153A1 SENSOR SYSTEM FOR LITHOGRAPHY Public/Granted day:2015-10-08
Information query
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