- 专利标题: Forming method of thermal insulation film
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申请号: US14933599申请日: 2015-11-05
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公开(公告)号: US09702052B2公开(公告)日: 2017-07-11
- 发明人: Naoki Nishikawa , Masaaki Tani , Hiroshi Hohjo
- 申请人: TOYOTA JIDOSHA KABUSHIKI KAISHA , KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO
- 申请人地址: JP Aichi-ken JP Nagakute-shi
- 专利权人: TOYOTA JIDOSHA KABUSHIKI KAISHA,KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO
- 当前专利权人: TOYOTA JIDOSHA KABUSHIKI KAISHA,KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO
- 当前专利权人地址: JP Aichi-ken JP Nagakute-shi
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2014-226775 20141107
- 主分类号: C23C28/00
- IPC分类号: C23C28/00 ; C25D11/18 ; C25D11/04 ; C25D11/24
摘要:
A forming method of a thermal insulation film, including: a first step of forming an anode oxidation coating film on an aluminum-based wall surface, the anode oxidation coating film including micro-pores each having a diameter of micrometer-scale and nano-pores each having a diameter of nanometer-scale; a second step of abrading a surface of the anode oxidation coating film with abrasive powders and bringing the abrasive powders into the micro-pores located at the formed abraded surface; and a third step of forming a protection film on the abraded surface to produce a thermal insulation film including the anode oxidation coating film and the protection film.
公开/授权文献
- US20160130716A1 FORMING METHOD OF THERMAL INSULATION FILM 公开/授权日:2016-05-12
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