Invention Grant
- Patent Title: Semiconductor device and method for manufacturing the same
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Application No.: US14886759Application Date: 2015-10-19
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Publication No.: US09704976B2Publication Date: 2017-07-11
- Inventor: Yuji Asano , Junichi Koezuka
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2009-090428 20090402
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L29/66 ; H01L27/12 ; H01L29/786 ; H01L21/02 ; H01L21/477 ; H01L29/423

Abstract:
An object is to provide a thin film transistor using an oxide semiconductor layer, in which contact resistance between the oxide semiconductor layer and source and drain electrode layers is reduced and electric characteristics are stabilized. The thin film transistor is formed in such a manner that a buffer layer including a high-resistance region and low-resistance regions is formed over an oxide semiconductor layer, and the oxide semiconductor layer and source and drain electrode layers are in contact with each other with the low-resistance region of the buffer layer interposed therebetween.
Public/Granted literature
- US20160043201A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2016-02-11
Information query
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