Invention Grant
- Patent Title: Systems and methods for detecting substrate alignment during a printing process
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Application No.: US14766971Application Date: 2013-02-11
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Publication No.: US09707583B2Publication Date: 2017-07-18
- Inventor: Feng Wan , Yiyang Wang
- Applicant: EMPIRE TECHNOLOGY DEVELOPMENT LLC
- Applicant Address: US DE Wilmington
- Assignee: Empire Technology Development LLC
- Current Assignee: Empire Technology Development LLC
- Current Assignee Address: US DE Wilmington
- Agency: Pepper Hamilton LLP
- International Application: PCT/US2013/025519 WO 20130211
- International Announcement: WO2014/123541 WO 20140814
- Main IPC: B05C11/10
- IPC: B05C11/10 ; B05B12/08 ; B41J11/46 ; B05C9/12 ; G01B11/27

Abstract:
Methods and systems for detecting alignment of a substrate during a printing process are described. In an embodiment, a printing apparatus may comprise an apparatus polarization area. A substrate may be configured with a substrate polarization area. The substrate may be arranged on the printing apparatus during printing such that the substrate polarization area overlaps the apparatus polarization area to form an alignment area. During printing, light may be radiated onto the alignment area to generate polarized light. The polarized light may be received by a polarized light receiving device. Characteristics of the light received by the polarized light receiving device may be monitored for variations. The variations may indicate that the substrate is not properly aligned for printing on the printing apparatus.
Public/Granted literature
- US20160001314A1 SYSTEMS AND METHODS FOR DETECTING SUBSTRATE ALIGNMENT DURING A PRINTING PROCESS Public/Granted day:2016-01-07
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