Invention Grant
- Patent Title: Process for manufacturing a nozzle plate
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Application No.: US14523625Application Date: 2014-10-24
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Publication No.: US09707761B2Publication Date: 2017-07-18
- Inventor: Dino Faralli , Michele Palmieri
- Applicant: STMicroelectronics S.r.l. , STMicroelectronics, Inc.
- Applicant Address: IT Agrate Brianza US TX Coppell
- Assignee: STMICROELECTRONICS S.R.L.,STMICROELECTRONICS, INC.
- Current Assignee: STMICROELECTRONICS S.R.L.,STMICROELECTRONICS, INC.
- Current Assignee Address: IT Agrate Brianza US TX Coppell
- Agency: Seed Intellectual Property Law Group LLP
- Priority: ITTO2012A0426 20120511
- Main IPC: B21D53/76
- IPC: B21D53/76 ; B23P17/00 ; B41J2/16 ; B41J2/14

Abstract:
A nozzle plate for a fluid-ejection device, comprising: a first substrate made of semiconductor material, having a first side and a second side; a structural layer extending on the first side of the first substrate, the structural layer having a first side and a second side, the second side of the structural layer facing the first side of the first substrate; at least one first through hole, having an inner surface, extending through the structural layer, the first through hole having an inlet section corresponding to the first side of the structural layer and an outlet section corresponding to the second side of the structural layer; a narrowing element adjacent to the surface of the first through hole, and including a tapered portion such that the inlet section of the first through hole has an area larger than a respective area of the outlet section of the first through hole.
Public/Granted literature
- US20170203568A9 PROCESS FOR MANUFACTURING A NOZZLE PLATE Public/Granted day:2017-07-20
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