Invention Grant
- Patent Title: Anti-reflection film and method for manufacturing anti-reflection film
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Application No.: US13647510Application Date: 2012-10-09
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Publication No.: US09709704B2Publication Date: 2017-07-18
- Inventor: Masaaki Miyahara , Minoru Shibuya , Terufusa Kunisada
- Applicant: Tamron Co., Ltd.
- Applicant Address: JP Saitama-Shi
- Assignee: Tamron Co., Ltd.
- Current Assignee: Tamron Co., Ltd.
- Current Assignee Address: JP Saitama-Shi
- Agency: The Webb Law Firm
- Priority: JP2011-224915 20111012
- Main IPC: G02B1/11
- IPC: G02B1/11 ; G02B1/115 ; G02B1/118

Abstract:
An object of the present invention is to provide an anti-reflection film excellent in high-temperature and high-humidity environment resistance and scratch resistance in addition to improved anti-reflection performance of a concave-convex nanostructure. To achieve the object, an anti-reflection film 10 comprises: a base layer 11 as a first optical thin film that is provided on an optical surface 21a of an optical element 21; a concave-convex nanostructure layer that is provided on a surface of the base layer 11 and is composed of a concave-convex nanostructure 12 formed so as to have a pitch width p between the convex parts 12b of shorter than an incident light wavelength; and a cover layer 13 as a second optical thin film that covers peaks of the convex part 12b with a void 14 being provided between the cover layer 13 and concave part 12a constituting the concave-convex nanostructure 12.
Public/Granted literature
- US20130271842A1 Anti-Reflection Film and Method for Manufacturing Anti-Reflection Film Public/Granted day:2013-10-17
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