- Patent Title: Transfer material, manufacturing method of electrostatic capacitance type input device, electrostatic capacitance type input device, and image display device including the same
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Application No.: US14627533Application Date: 2015-02-20
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Publication No.: US09710117B2Publication Date: 2017-07-18
- Inventor: Hideaki Ito , Shinichi Kanna
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2012-199402 20120911
- Main IPC: G06F3/044
- IPC: G06F3/044 ; G06F3/041 ; C09D151/00 ; G06F1/16

Abstract:
To provide a transfer material which is capable of improving the visibility of a transparent electrode pattern of an electrostatic capacitance type input device, and is capable of improving the productivity of the electrostatic capacitance type input device. A transfer material includes a temporary supporter and a transparent curable resin layer laminated on the temporary supporter, and a refractive index of the transparent curable resin layer at a wavelength of 550 nm is 1.55 or more.
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