- 专利标题: Intra-band tunnel FET
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申请号: US13863489申请日: 2013-04-16
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公开(公告)号: US09711632B2公开(公告)日: 2017-07-18
- 发明人: Gerben Doornbos , Krishna Kumar Bhuwalka
- 申请人: Taiwan Semiconductor Manufacturing Co. Ltd.
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Eschweiler & Potashnik, LLC
- 主分类号: H01L29/775
- IPC分类号: H01L29/775 ; H01L29/66 ; H01L29/06 ; B82Y10/00 ; B82Y40/00 ; H01L29/739 ; H01L29/20
摘要:
The present disclosure relates to an intra-band tunnel FET, which has a symmetric FET that is able to provide for a high drive current. In some embodiments, the disclosed intra-band tunnel FET has a source region having a first doping type and a drain region having the first doping type. The source region and the drain region are separated by a channel region. A gate region may generate an electric field that varies the position of a valence band and/or a conduction band in the channel region. By controlling the position of the valence band and/or the conduction band of the channel region, quantum mechanical tunneling of charge carries between the conduction band in the source region and in the drain region or between the valence band in the source region and in the drain region can be controlled.
公开/授权文献
- US20140264277A1 Intra-Band Tunnel FET 公开/授权日:2014-09-18
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