- 专利标题: Pressurized gas mist bathing system
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申请号: US13978478申请日: 2012-02-17
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公开(公告)号: US09713569B2公开(公告)日: 2017-07-25
- 发明人: Shoichi Nakamura
- 申请人: Shoichi Nakamura
- 申请人地址: JP Tokyo JP Higashichikuma-gun, Nagano
- 专利权人: ACP JAPAN CO., LTD.,Shoichi Nakamura
- 当前专利权人: ACP JAPAN CO., LTD.,Shoichi Nakamura
- 当前专利权人地址: JP Tokyo JP Higashichikuma-gun, Nagano
- 代理商 Manabu Kanesaka
- 优先权: JP2011-031831 20110217
- 国际申请: PCT/JP2012/053759 WO 20120217
- 国际公布: WO2012/111791 WO 20120823
- 主分类号: A61M35/00
- IPC分类号: A61M35/00 ; A61H33/02 ; A61H35/00 ; A61H33/14
摘要:
The invention is to provide a pressurized gas mist bathing system, ensuring hygiene and reduction in costs, by making only one part of the system disposable. This system causes a mist to contact the skin or the mucous membrane of a living body in a high pressure not less than a predetermined value, the mist is prepared by pulverizing liquid and the mist of micron size dissolving oxygen and/or carbon dioxide gases and comprises a gas supply means 10; a gas mist generating means 30 having a fluid nozzle 32 of generating the gas mist and a liquid storage 34 of storing liquid; a pressure cover 50 for covering the skin and the mucous membrane of the living body and formed with a space for sealing inside the gas mist supplied from the gas mist generating means 30; and a humors circulating means 41 for circulating the liquid from the liquid storage 34 of the gas mist generating means 30 to the fluid nozzle 32 and wherein, in the gas mist generating means 30, at least the liquid storage 34 is displaceable and replaced by another liquid storage.
公开/授权文献
- US20130281919A1 PRESSURIZED GAS MIST BATHING SYSTEM 公开/授权日:2013-10-24
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