- 专利标题: Multi charged particle beam writing apparatus, and multi charged particle beam writing method
-
申请号: US14944671申请日: 2015-11-18
-
公开(公告)号: US09715993B2公开(公告)日: 2017-07-25
- 发明人: Hideo Inoue
- 申请人: NuFlare Technology, Inc.
- 申请人地址: JP Yokohama
- 专利权人: NuFlare Technology, Inc.
- 当前专利权人: NuFlare Technology, Inc.
- 当前专利权人地址: JP Yokohama
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2014-241349 20141128
- 主分类号: H01J37/317
- IPC分类号: H01J37/317 ; H01J37/304 ; H01J37/04
摘要:
A multi charged particle beam writing apparatus includes a deflector to collectively deflect each beam in an “on” state, by tracking control in such a way as to follow stage movement, an obtaining processing circuitry to obtain a deviation amount of an irradiation position of each beam of multi-beams depending on a tracking amount of the tracking control, a correction coefficient calculation processing circuitry to calculate a correction coefficient for correcting the deviation amount of the irradiation position depending on the tracking amount, for each beam of the multi-beams and for each irradiation position, a shot data generation processing circuitry to generate shot data where deviation of an irradiation position of each beam of multi-beams depending on a tracking amount is to be corrected using a correction coefficient, for each tracking operation, and a deflection control processing circuitry to control plural blankers, based on the shot data.
公开/授权文献
信息查询