Invention Grant
- Patent Title: TFT, array substrate and method of forming the same
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Application No.: US14783802Application Date: 2015-09-09
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Publication No.: US09722094B2Publication Date: 2017-08-01
- Inventor: Mang Zhao , Gui Chen
- Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd. , Wuhan China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Shenzhen, Guangdong CN Wuhan, Hubei
- Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd,Wuhan China Star Optoelectronics Technology Co., Ltd
- Current Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd,Wuhan China Star Optoelectronics Technology Co., Ltd
- Current Assignee Address: CN Shenzhen, Guangdong CN Wuhan, Hubei
- Agent Andrew C. Cheng
- Priority: CN201510547997 20150831
- International Application: PCT/CN2015/089221 WO 20150909
- International Announcement: WO2017/035851 WO 20170309
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L29/423 ; H01L29/66

Abstract:
The present invention proposes a TFT, an array substrate, and a method of forming a TFT. The TFT includes a substrate, a buffer layer, a patterned poly-si layer, an isolation layer, a gate layer, and a source/drain pattern layer. The poly-si layer includes a heavily doped source and a heavily doped drain, and a channel. The gate layer includes a first gate area and a second gate area. The source/drain pattern layer includes a source pattern, a drain pattern and a bridge pattern, with the source pattern electrically connecting the heavily doped source, the drain pattern electrically connecting the heavily doped drain, and one end of the bridge pattern connecting the first gate area and the second gate area. The driving ability of the present inventive TFT is enhanced without affecting the leakage current.
Public/Granted literature
- US20170148921A1 TFT, Array Substrate And Method of Forming the Same Public/Granted day:2017-05-25
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