Invention Grant
- Patent Title: Brush cleaning method
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Application No.: US14817264Application Date: 2015-08-04
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Publication No.: US09723915B2Publication Date: 2017-08-08
- Inventor: Fu-Ming Huang , Liang-Guang Chen , Han-Hsin Kuo , Chi-Ming Tsai , He Hui Peng
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW
- Agency: Hauptman Ham, LLP
- Main IPC: B08B7/00
- IPC: B08B7/00 ; A46B17/06 ; B08B6/00 ; A46B15/00 ; B08B1/00
Abstract:
A method for cleaning a brush includes inducing a static charge on a surface of a first plate, wherein the first plate comprises at least one of silicon nitride (SixNy) or silicon oxide (SiaOb), wherein a, b, x and y are integers. The method further includes rotating the brush in contact with the surface of the first plate.
Public/Granted literature
- US20150335146A1 BRUSH CLEANING METHOD Public/Granted day:2015-11-26
Information query
