Invention Grant
- Patent Title: Structures and formation methods of micro-electro mechanical system device
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Application No.: US14525827Application Date: 2014-10-28
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Publication No.: US09725301B2Publication Date: 2017-08-08
- Inventor: Chia-Hua Chu , Chun-Wen Cheng , Shang-Ying Tsai , Chin-Wei Liang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsin-Chu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsin-Chu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: B81B7/02
- IPC: B81B7/02 ; H01L29/84 ; H01L21/02 ; B81B7/00 ; B81C1/00

Abstract:
A structure and a formation method of a micro-electro mechanical system (MEMS) device are provided. The MEMS device includes a cap substrate and a MEMS substrate bonded with the cap substrate. The MEMS substrate includes a first movable element and a second movable element. The MEMS device also includes a first enclosed space surrounded by the MEMS substrate and the cap substrate, and the first movable element is in the first enclosed space. The MEMS device further includes a second enclosed space surrounded by the MEMS substrate and the cap substrate, and the second movable element is in the second enclosed space. In addition, the MEMS device includes a pressure-changing layer in the first enclosed space.
Public/Granted literature
- US20150137280A1 STRUCTURES AND FORMATION METHODS OF MICRO-ELECTRO MECHANICAL SYSTEM DEVICE Public/Granted day:2015-05-21
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