Invention Grant
- Patent Title: Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition
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Application No.: US14364829Application Date: 2012-11-29
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Publication No.: US09725389B2Publication Date: 2017-08-08
- Inventor: Yun-Jun Kim , Hwan-Sung Cheon , Youn-Jin Cho , Yong-Woon Yoon , Chung-Heon Lee , Hyo-Young Kwon , Yoo-Jeong Choi
- Applicant: CHEIL INDUSTRIES INC.
- Applicant Address: KR Gumi-Si, Gyeongsangbuk-do
- Assignee: Cheil Industries, Inc.
- Current Assignee: Cheil Industries, Inc.
- Current Assignee Address: KR Gumi-Si, Gyeongsangbuk-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2011-0147384 20111230; KR10-2011-0147860 20111230
- International Application: PCT/KR2012/010203 WO 20121129
- International Announcement: WO2013/100409 WO 20130704
- Main IPC: C07C39/21
- IPC: C07C39/21 ; C07C39/205 ; C07C33/26 ; G03F7/039 ; G03F7/11 ; H01L21/027 ; C07C39/225 ; G03F1/00 ; G03F7/09 ; G03F7/20 ; H01L21/02 ; H01L21/033 ; H01L21/311
Abstract:
Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A′, L and n are the same as in the detailed description.
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