Invention Grant
- Patent Title: HMF-based phenol formaldehyde resin
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Application No.: US14881993Application Date: 2015-10-13
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Publication No.: US09725552B2Publication Date: 2017-08-08
- Inventor: Cheng-Han Hsieh , Hung-Jie Liou
- Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: C08L63/04
- IPC: C08L63/04 ; C08L77/02 ; C08G8/32 ; C09D163/00 ; C08G8/04 ; C08G8/06

Abstract:
A HMF-based phenol formaldehyde resin is provided. The HMF-based phenol formaldehyde resin has the formula In the formula, A includes non-substituted phenol, m-cresol, p-cresol, hydroquinone or disubstituted phenol, B includes phosphate ester, phosphate, phosphine oxide, phosphinate ester or phosphinate, and n is 3-20, wherein the disubstituted phenol has substituted groups including H, halide, C1-C20 alkyl group, C1-C20 alkenyl group, C1-C20 cycloalkyl group, C1-C20 cycloalkenyl group, homocyclic aromatic group or heterocyclic aromatic group.
Public/Granted literature
- US20160102165A1 HMF-BASED PHENOL FORMALDEHYDE RESIN Public/Granted day:2016-04-14
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