Invention Grant
- Patent Title: Multi-zone pedestal for plasma processing
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Application No.: US14738610Application Date: 2015-06-12
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Publication No.: US09725806B2Publication Date: 2017-08-08
- Inventor: Xing Lin , Bozhi Yang , Jianhua Zhou , Dale R. Dubois , Juan Carlos Rocha-Alvarez , Ramprakash Sankarakrishnan
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: C23C16/458
- IPC: C23C16/458 ; H01L21/687 ; H01L21/67 ; H01J37/32
Abstract:
A method and apparatus for a heated pedestal is provided. In one embodiment, the heated pedestal includes a body comprising a ceramic material, a plurality of heating elements encapsulated within the body, and one or more grooves formed in a surface of the body adjacent each of the plurality of heating elements, at least one side of the grooves being bounded by a ceramic plate.
Public/Granted literature
- US20160002779A1 MULTI-ZONE PEDESTAL FOR PLASMA PROCESSING Public/Granted day:2016-01-07
Information query
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