Invention Grant
- Patent Title: Amino sulfonic acid based polymers for copper electroplating
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Application No.: US14585229Application Date: 2014-12-30
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Publication No.: US09725816B2Publication Date: 2017-08-08
- Inventor: Weijing Lu , Zuhra I Niazimbetova , Maria Anna Rzeznik
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agent John J. Piskorski
- Main IPC: C25D3/38
- IPC: C25D3/38 ; C25D3/58 ; C25D5/38 ; H05K3/18 ; C08G59/00 ; C08G59/10 ; C08G59/50 ; C08G73/18 ; H05K3/24
Abstract:
Amino sulfonic acid based polymers are reaction products of amino sulfonic acids, an amine, polyepoxide compounds and epihalohydrin. The polymers may be used as levelers in copper electroplating baths, to provide good throwing power. Such reaction products may plate copper or copper alloys with good surface properties and good physical reliability.
Public/Granted literature
- US20160186347A1 AMINO SULFONIC ACID BASED POLYMERS FOR COPPER ELECTROPLATING Public/Granted day:2016-06-30
Information query
