Invention Grant
- Patent Title: Graphite wafer carrier for LED epitaxial wafer processes
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Application No.: US14588384Application Date: 2014-12-31
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Publication No.: US09725824B2Publication Date: 2017-08-08
- Inventor: Hsiang-Pin Hsieh , Qi Nan , Lei Pan
- Applicant: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Xiamen
- Assignee: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Xiamen
- Agency: Syncoda LLC
- Agent Feng Ma; Junjie Feng
- Priority: CN201210506371 20121203
- Main IPC: H01L21/687
- IPC: H01L21/687 ; H01L21/68 ; C30B25/12 ; C23C16/458 ; B25J11/00 ; H01L21/673

Abstract:
A graphite wafer carrier for LED epitaxial wafer processes, having a plurality of wafer pocket profiles above the carrier for carrying the epitaxial wafer substrate. The inner edge of the wafer pocket profile is a concave step with a plurality of inward-extended support portions; and also has a graphite wafer carrier edge and an axle hole at the center of the graphite wafer carrier. The pocket profiles of different quantities and sizes can be arranged on the basis of different process parameters. The disclosed structure can reduce or eliminate airflow interference and improve the wafer edge yield.
Public/Granted literature
- US20150118009A1 Graphite Wafer Carrier for LED Epitaxial Wafer Processes Public/Granted day:2015-04-30
Information query
IPC分类: