Invention Grant
- Patent Title: Grating pattern element, target material measuring apparatus, and target material measuring method
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Application No.: US14809374Application Date: 2015-07-27
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Publication No.: US09726603B2Publication Date: 2017-08-08
- Inventor: Joonhyung Lee , Sangkyu Kim , Seongho Cho
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2014-0156248 20141111
- Main IPC: G01N21/47
- IPC: G01N21/47 ; A61B10/00 ; A61B5/00 ; G01N33/543
Abstract:
A grating pattern element includes peaks which are periodically arranged and valleys provided between the peaks, and at least one of the peaks and at least one of the valleys includes an adsorbing material on a surface thereof which adsorbs a target material.
Public/Granted literature
- US20160131642A1 GRATING PATTERN ELEMENT, TARGET MATERIAL MEASURING APPARATUS, AND TARGET MATERIAL MEASURING METHOD Public/Granted day:2016-05-12
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