Invention Grant
- Patent Title: Method for fabricating nanoantenna array, nanoantenna array chip and structure for lithography
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Application No.: US14253522Application Date: 2014-04-15
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Publication No.: US09726788B2Publication Date: 2017-08-08
- Inventor: Kyeong Seok Lee , Won Mok Kim , Taek Sung Lee , Wook Seong Lee , Doo Seok Jeong , Inho Kim
- Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Applicant Address: KR Seoul
- Assignee: Korea Institute of Science and Technology
- Current Assignee: Korea Institute of Science and Technology
- Current Assignee Address: KR Seoul
- Agency: NSIP Law
- Priority: KR10-2013-0143068 20131122
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B5/00 ; G01N21/552 ; B82Y40/00 ; B82Y15/00 ; G02B5/02

Abstract:
A method for fabricating a nanoantenna array may include forming a resist layer on a substrate, forming a focusing layer having a dielectric microstructure array on the resist layer, diffusing light one-dimensionally in a specific direction by using a linear diffuser, forming an anisotropic pattern on the resist layer by illuminating the light diffused by the linear diffuser on the focusing layer and the resist layer, depositing a material suitable for a plasmonic resonance onto the substrate and the resist layer on which the pattern is formed, and forming a nanoantenna array on the substrate by removing the resist layer and the material deposited on the resist layer. A light diffusing angle by the linear diffuser and a size of the dielectric microstructure are determined based on an aspect ratio of the pattern to be formed.
Public/Granted literature
- US20150146180A1 METHOD FOR FABRICATING NANOANTENNA ARRAY, NANOANTENNA ARRAY CHIP AND STRUCTURE FOR LITHOGRAPHY Public/Granted day:2015-05-28
Information query
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