Invention Grant
- Patent Title: Imprint lithography apparatus and method
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Application No.: US13510596Application Date: 2010-10-01
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Publication No.: US09726973B2Publication Date: 2017-08-08
- Inventor: Sander Frederik Wuister
- Applicant: Sander Frederik Wuister
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2010/064662 WO 20101001
- International Announcement: WO2011/064021 WO 20110306
- Main IPC: B29C41/42
- IPC: B29C41/42 ; G03F7/00 ; B82Y10/00 ; B82Y40/00

Abstract:
A lithographic apparatus is disclosed that includes an imprint template holder configured to hold an imprint template, and a dispensing mechanism of polar molecules, wherein the dispensing mechanism of polar molecules is configured to provide polar molecules into a local environment in the vicinity of the imprint template, such that the concentration of polar molecules in the local environment in the vicinity of the imprint template is greater than the concentration of polar molecules in other parts of the lithographic apparatus.
Public/Granted literature
- US20120223460A1 IMPRINT LITHOGRAPHY APPARATUS AND METHOD Public/Granted day:2012-09-06
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