Invention Grant
- Patent Title: Patterning device, method of producing a marker on a substrate and device manufacturing method
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Application No.: US14764522Application Date: 2014-03-06
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Publication No.: US09726991B2Publication Date: 2017-08-08
- Inventor: Johannes Jacobus Matheus Baselmans , Franciscus Godefridus Casper Bijnen , Daniëlle Elisabeth Maria Palmen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2014/054340 WO 20140306
- International Announcement: WO2014/139855 WO 20140918
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G03F7/20 ; G03F1/42 ; G03F1/44

Abstract:
A patterning device, for use in forming a marker on a substrate by optical projection, the patterning device including a marker pattern having a density profile that is periodic with a fundamental spatial frequency corresponding to a desired periodicity of the marker to be formed. The density profile is modulated (such as sinusoidally) so as to suppress one or more harmonics of the fundamental frequency, relative to a simple binary profile having the fundamental frequency.
Public/Granted literature
- US20150370174A1 PATTERNING DEVICE, METHOD OF PRODUCING A MARKER ON A SUBSTRATE AND DEVICE MANUFACTURING METHOD Public/Granted day:2015-12-24
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