Invention Grant
- Patent Title: Measurement device, measurement apparatus, and method
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Application No.: US14875129Application Date: 2015-10-05
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Publication No.: US09728388B2Publication Date: 2017-08-08
- Inventor: Masayuki Naya , Shogo Yamazoe , Megumi Shiota , Makoto Suematsu
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2013-080164 20130408
- Main IPC: G01N21/00
- IPC: G01N21/00 ; H01J49/16 ; G01N21/65 ; H01J49/00 ; H01J49/04 ; H01J49/40

Abstract:
A metal film of a measurement device including a transparent dielectric substrate is irradiated with first light from a transparent dielectric substrate side, an optical electric field enhanced by an optical electric field enhancing effect of a localized plasmon induced to a surface of the metal film by the irradiation is generated, light emitted from the transparent dielectric substrate side is detected, a specimen installed on a surface of a metal fine concavo-convex structure layer and a matrix agent are irradiated with second light from a side opposite to the side of the irradiation with the first light in a state where a voltage is applied to the metal fine concavo-convex structure layer through a voltage application electrode, an analysis target substance for mass spectrometry in the specimen is desorbed from the surface by the irradiation, and the desorbed analysis target substance is detected.
Public/Granted literature
- US20160027631A1 MEASUREMENT DEVICE, MEASUREMENT APPARATUS, AND METHOD Public/Granted day:2016-01-28
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