Invention Grant
- Patent Title: Plating apparatus and plating method
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Application No.: US13277466Application Date: 2011-10-20
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Publication No.: US09728435B2Publication Date: 2017-08-08
- Inventor: Yoshio Minami
- Applicant: Yoshio Minami
- Applicant Address: JP Tokyo
- Assignee: Ebara Corporation
- Current Assignee: Ebara Corporation
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2010-236524 20101021; JP2010-264648 20101129; JP2011-158484 20110719
- Main IPC: C25D17/00
- IPC: C25D17/00 ; C25D17/06 ; H01L21/677

Abstract:
A plating apparatus allows a substrate holder to be serviced easily while ensuring easy access to the substrate holder and while a substrate is being processed in the plating apparatus. The plating apparatus includes a plating section for plating a substrate, a substrate holder for holding the substrate, a substrate holder transporter for holding and transporting the substrate holder, a stocker for storing the substrate holder, and a stocker setting section for storing the stocker therein. The stocker includes a moving mechanism for moving the stocker into and out of the stocker setting section.
Public/Granted literature
- US20120100709A1 PLATING APPARATUS AND PLATING METHOD Public/Granted day:2012-04-26
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