- Patent Title: System for non radial temperature control for rotating substrates
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Application No.: US14247816Application Date: 2014-04-08
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Publication No.: US09728471B2Publication Date: 2017-08-08
- Inventor: Wolfgang R. Aderhold , Aaron Hunter , Joseph M. Ranish
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: A21B2/00
- IPC: A21B2/00 ; F26B19/00 ; H01L21/66 ; H01L21/324 ; H01L21/67
Abstract:
Embodiments of the present invention provide apparatus and method for reducing non uniformity during thermal processing. One embodiment provides an apparatus for processing a substrate comprising a chamber body defining a processing volume, a substrate support disposed in the processing volume, wherein the substrate support is configured to rotate the substrate, a sensor assembly configured to measure temperature of the substrate at a plurality of locations, and one or more pulse heating elements configured to provide pulsed energy towards the processing volume.
Public/Granted literature
- US20140220710A1 SYSTEM FOR NON RADIAL TEMPERATURE CONTROL FOR ROTATING SUBSTRATES Public/Granted day:2014-08-07
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