Invention Grant
- Patent Title: Integrated circuit surface layer with adhesion-functional group
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Application No.: US14972936Application Date: 2015-12-17
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Publication No.: US09728500B2Publication Date: 2017-08-08
- Inventor: Siddharth K. Alur , Sri Chaitra J. Chavali , Robert A. May , Whitney M. Bryks
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: H01L23/52
- IPC: H01L23/52 ; H01L23/528 ; H01L21/768 ; H01L21/3105 ; H01L21/3205 ; H01L21/02

Abstract:
Embodiments of the present disclosure describe an integrated circuit and associated fabrication techniques and configurations, which may include forming on at least one of a metal layer or a polymer layer of an integrated circuit die a surface layer that includes an adhesion-functional group, and applying to the surface layer a next layer to adhere to the surface layer with the adhesion-functional group. In embodiments wherein the at least one of the metal layer or the polymer layer is a polymer layer, forming the surface layer may include copolymerizing on the polymer layer a polar monomer that includes the adhesion-functional group. In embodiments wherein the at least one of the metal layer or the polymer layer is a metal layer, forming the surface layer may include forming on the metal layer a self-assembled monolayer that includes amine group terminations. Other embodiments may be described and/or claimed.
Public/Granted literature
- US20170179019A1 INTEGRATED CIRCUIT SURFACE LAYER WITH ADHESION-FUNCTIONAL GROUP Public/Granted day:2017-06-22
Information query
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