Invention Grant
- Patent Title: Semiconductor device and method for manufacturing the same
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Application No.: US13687250Application Date: 2012-11-28
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Publication No.: US09728513B2Publication Date: 2017-08-08
- Inventor: Yu Jin Lee
- Applicant: SK hynix Inc.
- Applicant Address: KR Icheon
- Assignee: SK HYNIK INC.
- Current Assignee: SK HYNIK INC.
- Current Assignee Address: KR Icheon
- Priority: KR10-2012-0057430 20120530
- Main IPC: H01L23/62
- IPC: H01L23/62 ; H01L21/56 ; H01L23/525 ; H01L23/00

Abstract:
A semiconductor device includes a fuse pattern disposed over a semiconductor substrate, an epoxy mold compound (EMC) layer disposed over the fuse pattern, a first package substrate disposed over the EMC layer, an insulating film disposed over the first package substrate, and a second package substrate disposed over the insulating film. To the first package substrate, a Vss voltage or a negative voltage lower than the Vss voltage is applied to prevent impurities from migrating to the fuse pattern.
Public/Granted literature
- US20130320489A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2013-12-05
Information query
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