Invention Grant
- Patent Title: Semiconductor device with electrostatic discharge protection structure
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Application No.: US14252429Application Date: 2014-04-14
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Publication No.: US09728529B2Publication Date: 2017-08-08
- Inventor: Joachim Weyers , Franz Hirler , Anton Mauder , Markus Schmitt , Armin Tilke , Thomas Bertrams
- Applicant: Infineon Technologies Dresden GmbH
- Applicant Address: DE Dresden
- Assignee: Infineon Technologies Dresden GmbH
- Current Assignee: Infineon Technologies Dresden GmbH
- Current Assignee Address: DE Dresden
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L29/861

Abstract:
A semiconductor device comprises a semiconductor body having a first surface and a second surface opposite to the first surface. The semiconductor device further includes a first isolation layer on the first surface of the semiconductor body and a first electrostatic discharge protection structure on the first isolation layer. The first electrostatic discharge protection structure has a first terminal and a second terminal. A second isolation layer is provided on the electrostatic discharge protection structure. A gate contact area on the second isolation layer is electrically coupled to the first terminal of the first electrostatic discharge protection structure. An electric contact structure is arranged in an overlap area between the gate contact area and the semiconductor body. The electric contact structure is electrically coupled to the second terminal of the first electrostatic discharge protection structure and electrically isolated from the gate contact area.
Public/Granted literature
- US20150294966A1 Semiconductor Device with Electrostatic Discharge Protection Structure Public/Granted day:2015-10-15
Information query
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