Invention Grant
- Patent Title: Metallization having high power compatibility and high electrical conductivity
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Application No.: US14867759Application Date: 2015-09-28
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Publication No.: US09728705B2Publication Date: 2017-08-08
- Inventor: Charles Binninger , Ulrich Knauer , Helmut Zottl , Werner Ruile , Tomasz Jewula , Rudolf Nuessl
- Applicant: Snaptrack Inc.
- Applicant Address: US CA San Diego
- Assignee: QUALCOMM Incorporated
- Current Assignee: QUALCOMM Incorporated
- Current Assignee Address: US CA San Diego
- Agency: Patterson & Sheridan, L.L.P.
- Priority: DE102009056663 20091202
- Main IPC: H01L41/047
- IPC: H01L41/047 ; H01L23/498 ; H03H9/02 ; H03H9/145 ; H05K1/09 ; H05K3/38 ; H01L41/187 ; H01L41/29 ; H05K1/02 ; H05K1/03 ; H05K3/04

Abstract:
A metallization, for carrying current in an electrical component, includes a bottom layer overlying a substrate surface and includes titanium (Ti) or a titanium compound as main constituent. An upper layer overlies the bottom layer and includes copper (Cu) as main constituent. The bottom layer and the upper layer form a base layer. A top layer is in direct contact with the upper layer and includes aluminum (Al) as main constituent. The base layer further includes a middle layer, consisting of silver, that is arranged between the bottom layer and the upper layer.
Public/Granted literature
- US20160020378A1 Metallization Having High Power Compatibility and High Electrical Conductivity Public/Granted day:2016-01-21
Information query
IPC分类: