Invention Grant
- Patent Title: Micromechanical component with a reduced contact surface and its fabrication method
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Application No.: US15171002Application Date: 2016-06-02
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Publication No.: US09731964B2Publication Date: 2017-08-15
- Inventor: Alex Gandelhman , Andre Pin
- Applicant: Nivarox-FAR S.A.
- Applicant Address: CH Le Locle
- Assignee: Nivarox-FAR S.A.
- Current Assignee: Nivarox-FAR S.A.
- Current Assignee Address: CH Le Locle
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: EP15173825 20150625
- Main IPC: B81C1/00
- IPC: B81C1/00 ; G04D99/00 ; G04B13/02
Abstract:
The invention relates to a silicon-based component with at least one reduced contact surface which, formed from a method combining at least one oblique side wall etching step with a “Bosch” etch of vertical side walls, improves, in particular, the tribology of components formed by micromachining a silicon-based wafer.
Public/Granted literature
- US20160376147A1 MICROMECHANICAL COMPONENT WITH A REDUCED CONTACT SURFACE AND ITS FABRICATION METHOD Public/Granted day:2016-12-29
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