- 专利标题： Microlithographic projection exposure apparatus
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申请号： US13112357申请日： 2011-05-20
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公开(公告)号： US09733395B2公开(公告)日： 2017-08-15
- 发明人: Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
- 申请人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT GmbH
- 当前专利权人： Carl Zeiss SMT GmbH
- 当前专利权人地址： DE Oberkochen
- 代理机构： Fish & Richardson P.C.
- 优先权： DE102005041938 20050903
- 主分类号： G03B27/68
- IPC分类号： G03B27/68 ; G02B1/11 ; G03F7/20
摘要：
The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.
公开/授权文献
- US20110222043A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 公开/授权日：2011-09-15
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