Invention Grant
- Patent Title: Bonding apparatus and bonding process method
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Application No.: US14138196Application Date: 2013-12-23
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Publication No.: US09741596B2Publication Date: 2017-08-22
- Inventor: Konosuke Hayashi , Emi Matsui
- Applicant: Shibaura Mechatronics Corporation
- Applicant Address: JP Yokohama-Shi, Kanagawa-Ken
- Assignee: SHIBAURA MECHATRONICS CORPORATION
- Current Assignee: SHIBAURA MECHATRONICS CORPORATION
- Current Assignee Address: JP Yokohama-Shi, Kanagawa-Ken
- Agency: Pearne & Gordon LLP
- Priority: JP2012-287536 20121228
- Main IPC: B29C65/48
- IPC: B29C65/48 ; B29C65/78 ; B32B37/10 ; B32B38/18 ; B32B39/00 ; B32B43/00 ; C08J5/12 ; B23K37/04 ; H01L21/673 ; H01L21/67 ; H01L21/683

Abstract:
According to one embodiment, a bonding apparatus for processing a retained substrate includes a main body unit, a nozzle, a gas supply unit, and a substrate support unit. The nozzle opens on a face of the main body unit on a side that a first substrate is retained. The gas supply unit is configured to supply gas to the nozzle, to apply suction to the first substrate and to separate the substrate from the face of the main body unit. The substrate support unit is configured to support a peripheral edge portion of a second substrate provided in opposition to the first substrate with a predetermined gap.
Public/Granted literature
- US20140182761A1 BONDING APPARATUS AND BONDING PROCESS METHOD Public/Granted day:2014-07-03
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